Augmentation Rhinoplasty Minimizing Change of Nasion Level: A Simple Method.
- Author:
Deok Woo KIM
1
;
Sang Bum KIM
;
Seung Kyu HAN
;
Woo Kyung KIM
Author Information
1. Department of Plastic Surgery, Korea University College of Medicine, Seoul, Korea. pshan@kumc.or.kr
- Publication Type:Case Report
- Keywords:
Silicone implant;
Nasion;
Radix;
Rhinoplasty
- MeSH:
Asian Continental Ancestry Group;
Humans;
Rhinoplasty*;
Silicones
- From:Journal of the Korean Society of Plastic and Reconstructive Surgeons
2006;33(2):255-258
- CountryRepublic of Korea
- Language:Korean
-
Abstract:
Nasions are flat and located more caudally in Asian than in Caucasian. Implant insertions in rhinoplasties are apt to move nasions more cephallic, which can cause unsatisfactory results in Asian. The purpose of this study is introducing a simple technique in rhinoplasty avoiding unnatural nasion in augmentation rhinoplasty in Asian patients. Multiple radiating incisions were made at nasion level on inner side of silicone implant to fit it into the curvature around the nasion. Between October 2001 and October 2003, 27 patients underwent augmentation rhinoplasties using this technique and results were evaluated. Preoperative and postoperative photographs of patients were used to measure the levels of nasion from medial canthus. The mean nasion level from medial canthus of preopertive patients were 3.46+/-0.87 mm and postoprative patient was 4.98+/-0.96 mm. The mean difference between preoperative nasion level and postoperative nasion level was 1.52 mm. There was no complication such as extrusion, displacement or infection. This technique of radiating incisions on inner side of the silicon implant can minimize cephalic migration of the nasion level in augmentation rhinoplasty in Asian.
