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Complement Factor H*

INTRODUCTIONRecent periodicals direct that reactive carbonyl compounds are formed due to existing oxidative stress in type 2 diabetes mellitus, which further nonenzymatically react with proteins and lipids to form irreversible advanced glycation end products (AGE) and advanced lipoxidation end products (ALE). In type 2 diabetes mellitus, insulin resistance plays a pivotal role in hyperglycaemia. In this study, we tried to fi nd the relation between insulin resistance and carbonyl stress.

MATERIALS AND METHODSForty-seven patients of type 2 diabetes mellitus (age 51 ± 5.06 years) were selected and fasting plasma glucose, serum insulin, total carbonyl compounds, HbA1c, thiobarbituric acid reacting substances (TBARS) and Trolox equivalent antioxidant capacity (TEAC) were estimated using standard protocols. Homeostatic model assessement of insulin resistance (HOMA-IR) was evaluated from fasting plasma glucose and serum insulin levels.

RESULTSWe found highly significant correlations of carbonyl compounds with HOMA-IR, fasting plasma glucose and glycated haemoglobin (HbA1c). Correlations of lipid peroxidation end product, TBARS were not so significant.

CONCLUSIONFindings from this study indicate that the level of carbonyl compounds can be a biomarker of insulin resistance in type 2 diabetes mellitus.

Blood Glucose ; metabolism ; Diabetes Mellitus, Type 2 ; metabolism ; physiopathology ; Female ; Glycation End Products, Advanced ; blood ; metabolism ; Homeostasis ; physiology ; Humans ; Hyperglycemia ; metabolism ; Insulin Resistance ; physiology ; Male ; Middle Aged ; Oxidative Stress ; physiology