1.Shear bond strength of resin cement to an acid etched and a laser irradiated ceramic surface.
Pinar KURSOGLU ; Pelin Fatma Karagoz MOTRO ; Haktan YURDAGUVEN
The Journal of Advanced Prosthodontics 2013;5(2):98-103
PURPOSE: To evaluate the effects of hydrofluoric acid etching and Er,Cr:YSGG laser irradiation on the shear bond strength of resin cement to lithium disilicate ceramic. MATERIALS AND METHODS: Fifty-five ceramic blocks (5 mm x 5 mm x 2 mm) were fabricated and embedded in acrylic resin. Their surfaces were finished with 1000-grit silicon carbide paper. The blocks were assigned to five groups: 1) 9.5% hydrofluoric-acid etching for 60 s; 2-4), 1.5-, 2.5-, and 6-W Er,Cr:YSGG laser applications for 60 seconds, respectively; and 5) no treatment (control). One specimen from each group was examined using scanning electron microscopy. Ceramic primer (Rely X ceramic primer) and adhesive (Adper Single Bond) were applied to the ceramic surfaces, followed by resin cement to bond the composite cylinders, and light curing. Bonded specimens were stored in distilled water at 37degrees C for 24 hours. Shear bond strengths were determined by a universal testing machine at 1 mm/min crosshead speed. Data were analyzed using Kruskal-Wallis and Mann-Whitney U-tests (alpha=0.05). RESULTS: Adhesion was significantly stronger in Group 2 (3.88 +/- 1.94 MPa) and Group 3 (3.65 +/- 1.87 MPa) than in Control group (1.95 +/- 1.06 MPa), in which bonding values were lowest (P<.01). No significant difference was observed between Group 4 (3.59 +/- 1.19 MPa) and Control group. Shear bond strength was highest in Group 1 (8.42 +/- 1.86 MPa; P<.01). CONCLUSION: Er,Cr:YSGG laser irradiation at 1.5 and 2.5 W increased shear bond strengths between ceramic and resin cement compared with untreated ceramic surfaces. Irradiation at 6 W may not be an efficient ceramic surface treatment technique.
Adhesives
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Carbon Compounds, Inorganic
;
Ceramics
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Collodion
;
Dental Porcelain
;
Hydrofluoric Acid
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Light
;
Lithium
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Microscopy, Electron, Scanning
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Resin Cements
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Silicon Compounds
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Water