No abstract available.
Cohort Studies ; Female ; Hematologic Neoplasms/mortality ; Humans ; Male ; *Occupational Health ; Research/trends ; Retrospective Studies ; *Semiconductors ; Volatile Organic Compounds/toxicity

This study presents the development and validation of a risk assessment program of highly pathogenic avian influenza (HPAI). This program was developed by the Korean government (Animal and Plant Quarantine Agency) and a private corporation (Korea Telecom, KT), using a national database (Korean animal health integrated system, KAHIS).

BACKGROUND: The photolithography process in the semiconductor industry uses various chemicals with little information on their constitution. This study aimed to identify the chemical constituents of photoresist (PR) products and their by-products and to compare these constituents with material safety data sheets (MSDSs) and analytical results. METHODS: A total of 51 PRs with 48 MSDSs were collected. Analysis consisted of two parts: First, the constituents of the chemical products were identified and analyzed using MSDS data; second, for verification of the by-products of PR, volatile organic compounds were analyzed. The chemical constituents were categorized according to hazards. RESULTS: Forty-five of 48 products contained trade secrets in amounts ranging from 1 to 65%. A total of 238 ingredients with multiple counting (35 ingredients without multiple counting) were identified in the MSDS data, and 48.7% of ingredients were labeled as trade secrets under the Korea Occupational Safety and Health Act. The concordance rate between the MSDS data and the analytical result was 41.7%. The by-product analysis identified 129 chemicals classified according to Chemical Abstracts Service No., with 17 chemicals that are carcinogenic, mutagenic, and reprotoxic substances. Formaldehyde was found to be released from 12 of 21 products that use novolak resin. CONCLUSION: We confirmed that several PRs contain carcinogens, and some were not specified in the toxicological information in the MSDS. Hazardous chemicals, including benzene and formaldehyde, are released from PRs products as by-products. Therefore, it is necessary to establish a systematic management system for chemical compounds and the working environment.
Benzene ; Carcinogens ; Constitution and Bylaws ; Formaldehyde ; Hazardous Substances ; Korea ; Material Safety Data Sheets ; Occupational Health ; Semiconductors ; Volatile Organic Compounds

Background: Research on the status of many chemicals used in the semiconductor industry is needed. The purpose of this study was to describe the overall status of chemical use in the semiconductor industry in Korea and to examine it from a health perspective. Methods: Data on the status of chemical use and safety data sheets at 11 of 12 major semiconductor workplaces in Korea were collected. The number of chemical products and chemical constituents, quantities of chemicals, and trade secret ingredients used, as well as the health hazards were examined. Results: On average, 210 chemical products and 135 chemical constituents were used at the surveyed workplaces. Among all chemical products, 33% (range: 16–56%) contained at least one trade secret ingredient. Most of the trade secret ingredients were used in the photolithography process. Several carcinogens, including sulfuric acid, chromic acid, ethylene oxide, crystalline silica, potassium dichromate, and formaldehyde were also used. Only 29% (39 of 135) of the chemical constituents had occupational exposure limits, and more than 60% had no National Fire Protection Association health, safety, and reactivity ratings. Based on the aforementioned results, this study revealed the following. First, many chemical products and constituents are being used in the semiconductor industry and many products contained trade secret ingredients. Second, many products contained significant amounts of carcinogenic, mutagenic, and reproductive toxicant materials. Conclusion We conclude that protecting workers in the semiconductor industry against harm from chemical substances will be difficult, due to widespread use of trade secret ingredients and a lack of hazard information. The findings of the status of chemical use and the health and safety risks in semiconductor industry will contribute to epidemiological studies, safe workplace, and worker health protection.

Background: Research on the status of many chemicals used in the semiconductor industry is needed. The purpose of this study was to describe the overall status of chemical use in the semiconductor industry in Korea and to examine it from a health perspective. Methods: Data on the status of chemical use and safety data sheets at 11 of 12 major semiconductor workplaces in Korea were collected. The number of chemical products and chemical constituents, quantities of chemicals, and trade secret ingredients used, as well as the health hazards were examined. Results: On average, 210 chemical products and 135 chemical constituents were used at the surveyed workplaces. Among all chemical products, 33% (range: 16–56%) contained at least one trade secret ingredient. Most of the trade secret ingredients were used in the photolithography process. Several carcinogens, including sulfuric acid, chromic acid, ethylene oxide, crystalline silica, potassium dichromate, and formaldehyde were also used. Only 29% (39 of 135) of the chemical constituents had occupational exposure limits, and more than 60% had no National Fire Protection Association health, safety, and reactivity ratings. Based on the aforementioned results, this study revealed the following. First, many chemical products and constituents are being used in the semiconductor industry and many products contained trade secret ingredients. Second, many products contained significant amounts of carcinogenic, mutagenic, and reproductive toxicant materials. Conclusion We conclude that protecting workers in the semiconductor industry against harm from chemical substances will be difficult, due to widespread use of trade secret ingredients and a lack of hazard information. The findings of the status of chemical use and the health and safety risks in semiconductor industry will contribute to epidemiological studies, safe workplace, and worker health protection.

Background: Refractory ceramic fibers (RCFs) are a suspected carcinogen but have been widely used as insulations. Depending on the temperature, RCFs can transform into crystalline SiO2, which is a carcinogen that can be present in the air during bulk RCF handling. This study analyzed the physicochemical and morphological characteristics of RCFs at high temperatures and determined the exposure levels during the semiconductor scrubber maintenance. Methods: Sampling was conducted at a company that manufactures semiconductor scrubbers using RCFs as insulation. Bulk RCF samples were collected both before and after exposure to a scrubber temperature of 700°C. Airborne RCFs were collected during scrubber maintenance, and their characteristics were analyzed using microscopes. Results: The components of bulk RCFs were SiO2 and Al2O3, having an amorphous structure. Airborne RCFs were morphologically different from bulk RCFs in size, which could negatively affect maintenance workers’ health. 58% of airborne RCFs correspond to the size of thoracic and respirable fibers. RCFs did not crystallize at high temperatures. The exposure caused by airborne RCFs during the scrubber frame assembly and insulation replacement was higher than the occupational exposure limit. Conclusion Workers conducting insulation replacement are likely exposed to airborne RCFs above safe exposure limits. As RCFs are suspected carcinogens, this exposure should be minimized through prevention and precautionary procedures.

Background: There is little information about the airborne hazardous agents released during the heat treatment when manufacturing a welding material. This study aimed to evaluate the airborne hazardous agents generated at welding material manufacturing sites through area sampling. Methods: concentration of airborne particles was measured using a scanning mobility particle sizer and optical particle sizer. Total suspended particles (TSP) and respirable dust samples were collected on polyvinyl chloride filters and weighed to measure the mass concentrations. Volatile organic compounds and heavy metals were analyzed using a gas chromatography mass spectrometer and inductively coupled plasma mass spectrometer, respectively. Results: The average mass concentration of TSP was 683.1 ± 677.4 μg/m3, with respirable dust accounting for 38.6% of the TSP. The average concentration of the airborne particles less than 10 μm in diameter was 11.2–22.8 × 104 particles/cm3, and the average number of the particles with a diameter of 10–100 nm was approximately 78–86% of the total measured particles (<10 μm). In the case of volatile organic compounds, the heat treatment process concentration was significantly higher (p < 0.05) during combustion than during cooling. The airborne heavy metal concentrations differed depending on the materials used for heat treatment. The content of heavy metals in the airborne particles was approximately 32.6%. Conclusions Nanoparticle exposure increased as the number of particles in the air around the heat treatment process increases, and the ratio of heavy metals in dust generated after the heat treatment process is high, which may adversely affect workers' health.

The major purpose of this study is to construct a retrospective exposure assessment for benzene through a review of literature on Korea. Airborne benzene measurements reported in 34 articles were reviewed. A total of 15,729 individual measurements were compiled. Weighted arithmetic means [AM(w)] and their variance calculated across studies were summarized according to 5-year period intervals (prior to the 1970s through the 2010s) and industry type. Industries were classified according to Korea Standard Industrial Classification (KSIC) using information provided in the literature. We estimated quantitative retrospective exposure to benzene for each cell in the matrix through a combination of time and KSIC. Analysis of the AM(w) indicated reductions in exposure levels over time, regardless of industry, with mean levels prior to the 1980e1984 period of 50.4 ppm (n = 2,289), which dropped to 2.8 ppm (n = 305) in the 1990e1994 period, and to 0.1 ppm (n = 294) in the 1995e1999 period. There has been no improvement since the 2000s, when the AM(w) of 4.3 ppm (n = 6,211) for the 2005e2009 period and 4.5 ppm (n = 3,358) for the 2010e2013 period were estimated. A comparison by industry found no consistent patterns in the measurement results. Our estimated benzene measurements can be used to determine not only the possibility of retrospective exposure to benzene, but also to estimate the level of quantitative or semiquantitative retrospective exposure to benzene.
Benzene* ; Classification ; Korea* ; Retrospective Studies

A precise pre-procedural evaluation of mitral valve (MV) pathology is essential for planning the surgical strategy for severe mitral regurgitation (MR) and preparing for the intraoperative procedure. In the present case, a 38-year-old woman was scheduled to undergo MV replacement due to severe MR. She had a history of undergoing percutaneous balloon valvuloplasty due to rheumatic mitral stenosis during a previous pregnancy. A preoperative transthoracic echocardiography suggested a tear in the mid tip of the anterior mitral leaflet. However, the "en face" view of the MV in the left atrial perspective using intraoperative real time three-dimensional transesophageal echocardiography (RT 3D-TEE) provided a different diagnosis: a torn cleft in the P2-scallop of the posterior mitral leaflet (PML) with rupture of the chordae. Thus, surgical planning was changed intraoperatively to MV repair (MVRep) consisting of patch closure of the PML, commissurotomy, and lifting annuloplasty. The present case shows that intraoperative RT 3D-TEE provides more precise and reliable spatial information of MV for MVRep and facilitates critical surgical decision-making.
Adult ; Balloon Valvuloplasty ; Diagnosis ; Echocardiography ; Echocardiography, Transesophageal* ; Female ; Humans ; Lifting ; Mitral Valve Insufficiency ; Mitral Valve Stenosis ; Mitral Valve* ; Pathology ; Pregnancy ; Rupture

BACKGROUND: IgA nephropathy (IgAN) is the most common form of glomerulonephritis, a principal cause of end-stage renal disease (ESRD) worldwide. The mechanisms of onset and progression of IgAN have not been fully revealed, and epidemiologic studies have yielded diverging opinions as to the role of occupational exposure to organic solvents in the initiation or worsening of IgAN. As the authors encountered a laboratory worker with IgAN that progressed to ESRD, we present a case report of IgAN progression due to dichloromethane exposure along with a review of literature. CASE PRESENTATION: A 41-year-old male laboratory worker began to experience gross painless hematuria after two years of occupational exposure to toluene. Although clinical follow-up was initiated under the impression of IgAN based on clinical findings, the patient continued to work for four more years in the same laboratory, during which he was in charge of laboratory analysis with direct exposure to a high concentration of dichloromethane without proper protective equipment. During that time, his renal function rapidly worsened and finally progressed to ESRD 10 years after the first clinical symptoms. The result of exposure assessment through reenactment of his work exceeded the occupational exposure limit for dichloromethane to a considerable degree. CONCLUSIONS: The causal association between occupational solvent exposure and IgAN is still unclear; therefore, this case report could be used as a basis to support the relevance of occupational solvent exposure to IgAN and/or its progression. Early intervention as well as close monitoring of laboratory workers exposed to various organic solvents is important to prevent or delay the progression of glomerulonephritis to ESRD in the occupational setting.
Adult ; Early Intervention (Education) ; Epidemiologic Studies ; Follow-Up Studies ; Glomerulonephritis ; Glomerulonephritis, IGA* ; Hematuria ; Humans ; Immunoglobulin A* ; Kidney Failure, Chronic* ; Male ; Methylene Chloride ; Occupational Exposure ; Solvents ; Toluene