A comparison between 635/808 nm dual-wavelength semiconductor laser and He-Ne laser irradiation in the healing of surgical incisions
10.3760/cma.j.issn.1673-4181.2014.02.011
- VernacularTitle:635/808 nm双波长半导体激光与632.8 nm氦氖激光照射对术后切口愈合疗效的比较
- Author:
Juan WANG
;
Fuping WANG
;
Chuanying DUAN
;
Hongshun MA
- Publication Type:Journal Article
- Keywords:
Semiconductor laser;
Incision healing;
Laser irradiation;
He-Ne laser
- From:
International Journal of Biomedical Engineering
2014;37(2):111-114
- CountryChina
- Language:Chinese
-
Abstract:
Objective To compare healing effects of surgical incisions using 635 /808 nm dualwavelength semiconductor laser and He-Ne laser irradiation.Methods 168 cases of non-malignant tumor surgery patients were randomly divided into 2 groups:test group including 83 cases which were treated on the surgical incisions by laser irradiation of the semiconductor illumination with low-intensity power; positive control group with 85 cases treated with He-Ne laser.Observation was carried out on incision healing by the clinic manifestations including redness,heat,swelling,pain,exudation,wound open,adverse event and the incision length offset.Results There was no significant difference between experimental group and the control group on incision healing (P＞0.05).Conclusions The treatment efficacy of the dual-wavelength semiconductor laser on surgical incisions healing is similar with that of the He-Ne laser.
