Screening and analysis of plasma microRNA profile in benzene exposed workers.
- Author:
Yang LIU
1
;
Hengdong ZHANG
1
;
Xianwen CHEN
1
;
Jinglian CAO
1
;
Li ZHONG
1
;
Lu DING
1
;
Jing LIU
1
;
Baoli ZHU
2
Author Information
- Publication Type:Journal Article
- MeSH: Adult; Benzene; adverse effects; Female; Humans; Male; MicroRNAs; genetics; Middle Aged; Occupational Exposure; adverse effects; Oligonucleotide Array Sequence Analysis; Young Adult
- From: Chinese Journal of Industrial Hygiene and Occupational Diseases 2014;32(7):511-515
- CountryChina
- Language:Chinese
-
Abstract:
OBJECTIVETo find out and analyze differentially expressed miRNAs in the plasma of benzene exposed workers, and explore the potential roles of plasma miRNAs in the development of hematologic toxicity induced by benzene exposure.
METHODSBy individual matching, low blood cell group, unstable blood cell group and normal group of 10 benzene exposed workers in each group were taken as subjects. Microarray was used to find out differentially expressed miRNAs among three groups. Three miRNAs validated by real-time quantitative PCR. Target genes of 9 miRNAs with the high abundance and significant difference were predicted using Target scan, Picture and miRanda softwares. David 6.7 online platform was used to perform GO term enrichment and KEGG pathway analysis of those targets.
RESULTSMicroarray screened out that 138 miRNAs were differentially expressed. Three significant classes of differentially expressed miRNAs were found with the cluster analysis. The detected expressions of miR-638, let-7f-5p and miR-223-3p by relative RT-qPCR was consistent with the microarray date. Pathway analysis showed that the most enriched pathway was focal adhesion, with 6 potential functional targets, including SOS₂, VCL, CCND2, COL4A6, IGF1 and MAPK1.
CONCLUSIONWe have identified the plasma miRNA profile in benzene exposed workers, and further analysis indicates that focal adhesion-associated miRNAs play a potential role in hematologic toxicity induced by benzene exposure.