Effects of implant thread profile on insertion stress generation in cortical bone studied by dynamic finite element simulation.
10.4047/jkap.2014.52.4.279
- Author:
Won Jae YU
1
;
Seok Joon HA
;
Jin Hyun CHO
Author Information
1. Department of Orthodontics, School of Dentistry, Kyungpook National University, Daegu, Korea.
- Publication Type:Original Article
- Keywords:
Dynamic finite element simulation;
Implant thread profile
- MeSH:
Bone Plates;
Finite Element Analysis;
Humans;
Implants, Experimental;
Osseointegration
- From:The Journal of Korean Academy of Prosthodontics
2014;52(4):279-286
- CountryRepublic of Korea
- Language:Korean
-
Abstract:
PURPOSE: The aim of this study was to investigate the effect of implant thread profile on the marginal bone stresses which develop during implant insertion. MATERIALS AND METHODS: Four experimental implants were created by placing four different thread systems on the body (4.1 mm x 10 mm) of the ITI standard implant. The thread types studied in this study included the buttress, v-shape, reverse buttress, and square shape threads. In order to examine the insertion stress generation, 3D dynamic finite element analysis was performed which simulated the insertion process of implants into a 1.2 mm thick cortical bone plate (containing 3.5 mm pilot hole) using a PC-based DEFORM 3D (ver 6.1, SFTC, Columbus, OH, USA) program. RESULTS: Insertion stresses higher than human cortical bone developed around the implants. The level of insertion stresses was much different depending on the thread. Stress level was lowest near the v-shape thread, and highest near the square shaped thread. Difference in the interfacial bone stress level was more noticeable near the valley than the tip of the threads. CONCLUSION: Among the four threads, the v-shape thread was turned out to minimize the insertion stress level and thereby create better conditions for implant osseointegration.
