Progress in ventricular arrhythmias after implantation of continuous-flow left ventricular assist devices
10.3760/cma.j.cn112434-20230920-00067
- VernacularTitle:连续血流左心室辅助装置植入后室性心律失常的研究进展
- Author:
Zean FU
1
;
Zhigang LIU
Author Information
1. 天津医科大学心血管病临床学院 泰达国际心血管病医院心血管外科，天津 300457
- From:
Chinese Journal of Thoracic and Cardiovascular Surgery
2024;40(5):269-276
- CountryChina
- Language:Chinese
-
Abstract:
Continuous flow left ventricular assist devices (CF-LVAD) have become one of the long-term treatment options for patients with end-stage heart failure. In such patients, ventricular arrhythmia (VA) is a common complication after implantation. Severe VA after CF-LVAD implantation can cause adverse events such as impaired right ventricular filling and hemodynamic deterioration, which in turn affects the patient's prognosis. By reviewing the relevant research progress of VA after CF-LVAD implantation, this article provides an overview of the epidemiology, perioperative management, and therapeutic options of postimplantation VA, aiming to summarize the pathogenesis, clinical manifestations, and prognostic outcomes of postimplantation VA, and to provide ideas for a more comprehensive and in-depth study.
